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Quantitative study of molecular N_2 trapped in disordered GaN:O films

2004-08-09
B.J. Ruck, A. Koo, U.D. Lanke, F. Budde, S. Granville, H.J. Trodahl (1), A. Bittar (2), J.B. Metson (3), V.J. Kennedy, A. Markwitz (4) ((1) Victoria University of Wellington, New Zealand, (2) Industrial Research Ltd., New Zealand, (3) Auckland University, New Zealand, (4) Institute of Geological and Nuclear Sciences, New Zealand)

Abstract

The structure of disordered GaN:O films grown by ion-assisted deposition is investigated using x-ray absorption near-edge spectroscopy and Raman spectroscopy. It is found that between 4 and 21 % of the nitrogen in the films is in the form of molecular N_2 that interacts only weakly with the surrounding matrix. The anion to cation ratio in the GaN:O host remains close to unity, and there is a close correlation between the N_2 fraction, the level of oxygen impurities, and the absence of short-range order in the GaN:O matrix.

Abstract (translated by Google)
URL

https://arxiv.org/abs/cond-mat/0408174

PDF

https://arxiv.org/pdf/cond-mat/0408174


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