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A Temperature Analysis of High-power AlGaN/GaN HEMTs

2007-09-12
J. Das, H. Oprins, H. Ji, A. Sarua, W. Ruythooren, J. Derluyn, M. Kuball, M. Germain, G. Borghs

Abstract

Galliumnitride has become a strategic superior material for space, defense and civil applications, primarily for power amplification at RF and mm-wave frequencies. For AlGaN/GaN high electron mobility transistors (HEMT), an outstanding performance combined together with low cost and high flexibility can be obtained using a System-in-a-Package (SIP) approach. Since thermal management is extremely important for these high power applications, a hybrid integration of the HEMT onto an AlN carrier substrate is proposed. In this study we investigate the temperature performance for AlGaN/GaN HEMTs integrated onto AlN using flip-chip mounting. Therefore, we use thermal simulations in combination with experimental results using micro-Raman spectroscopy and electrical dc-analysis.

Abstract (translated by Google)
URL

https://arxiv.org/abs/0709.1868

PDF

https://arxiv.org/pdf/0709.1868


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