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Macro- and micro-strain in GaN nanowires on Si

2012-06-12
Bernd Jenichen, Oliver Brandt, Carsten Pfueller, Pinar Dogan, Mathias Knelangen, Achim Trampert

Abstract

We analyze the strain state of GaN nanowire ensembles by x-ray diffraction. The nanowires are grown by molecular beam epitaxy on a Si(111) substrate in a self-organized manner. On a macroscopic scale, the nanowires are found to be free of strain. However, coalescence of the nanowires results in micro-strain with a magnitude from +-0.015% to +-0.03%.This micro-strain contributes to the linewidth observed in low-temperature photoluminescence spectra.

Abstract (translated by Google)
URL

https://arxiv.org/abs/1206.2525

PDF

https://arxiv.org/pdf/1206.2525


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