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Low-resistance GaN tunnel homojunctions with 150 kA/cm^2 current and repeatable negative differential resistance

2016-02-09
Fatih Akyol, Sriram Krishnamoorthy, Yuewei Zhang, Jared M. Johnson, Jinwoo Hwang, Siddharth Rajan

Abstract

We report GaN n++/p++ interband tunnel junctions with repeatable negative differential resistance and low resistance. Reverse and forward tunneling current densities were observed to increase as Si and Mg doping concentrations were increased. Hysteresis-free, bidirectional negative differential resistance was observed at room temperature from these junctions at a forward voltage of ~1.6-2 V. Thermionic PN junctions with tunnel contact to the p-layer exhibited forward current density of 150 kA/cm^2 at 7.6 V, with a low series device resistance of 1 x 10^-5 this http URL^2.

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URL

https://arxiv.org/abs/1601.04353

PDF

https://arxiv.org/pdf/1601.04353


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