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Thick GaN film stress-induced self-separation

2019-02-09
Vladislav Voronenkov, Andrey Leonidov, Yuri Lelikov, Andrey Zubrilov, Yuri Shreter

Abstract

Cracking of thick GaN films on sapphire substrates during the cooling down after the growth was studied. The cracking was suppressed by increasing the film-to-substrate thickness ratio and by using an intermediate carbon buffer layer, that reduced the binding energy between the GaN film and the substrate. Wafer-scale self-separation of thick GaN films has been demonstrated.

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URL

https://arxiv.org/abs/1902.03463

PDF

https://arxiv.org/pdf/1902.03463


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